| 摘要 |
PROBLEM TO BE SOLVED: To provide a very precise and reliable mask which does not develops warping or deformation, to provide a (stencil) mask which allows very accurate ion implantation in an ion implantation technology, and to provide a very accurate and reliable method for ion implantation which needs no formation of a resist pattern. SOLUTION: The mask comprises a mask pattern section, a plate-like body having at least one pn junction, and a current supply section for supplying a current to the pn junction. In the mask, a current is applied to the pn junction to induce the Peltier effect to control the temperature of the mask pattern section. With this mask, an ion implantation region can be formed with high reliability without forming a resist pattern. COPYRIGHT: (C)2004,JPO&NCIPI
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