| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus suitable for the manufacture of a micro-meter or smaller scale devices by locally selective chemical reaction, preferably with high throughput. SOLUTION: A flowcell having a plurality of separate chambers is disposed on a substrate table, and a fluid is brought into contact with exposed areas of the substrate to interact therewith. Thereby, a series of exposures and chemical processes can be carried out without removing the substrate from the substrate table. COPYRIGHT: (C)2004,JPO&NCIPI
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