发明名称 Micromirror unit fabrication method and micromirror unit made by the same
摘要 A method of making a micromirror unit is provided. In accordance with the method, a micromirror unit is made from a material substrate having a multi-layer structure composed of silicon layers and at least one intermediate layer. The resulting micromirror unit includes a mirror forming base, a frame and a torsion bar. The method includes the following steps. First, a pre-torsion bar is formed by subjecting one of the silicon layers to etching. The obtained pre-torsion bar is rendered smaller in thickness than the mirror forming base and is held in contact with the intermediate layer. Then, the desired torsion bar is obtained by removing the intermediate layer contacting with the pre-torsion bar.
申请公布号 US2004141894(A1) 申请公布日期 2004.07.22
申请号 US20040755339 申请日期 2004.01.13
申请人 FUJITSU LIMITED;FUJITSU MEDIA DEVICES LIMITED 发明人 MIZUNO YOSHIHIRO;UEDA SATOSHI;TSUBOI OSAMU;SAWAKI IPPEI;OKUDA HISAO;YAMAGISHI FUMIO;KOUMA NORINAO
分类号 B01D53/88;B01J8/04;B81B3/00;B81C1/00;C01B3/16;G02B26/08;(IPC1-7):F28D7/00 主分类号 B01D53/88
代理机构 代理人
主权项
地址