DYNAMIC ADAPTIVE SAMPLING RATE FOR MODEL PREDICTION
摘要
<p>A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.</p>
申请公布号
WO2004061938(A1)
申请公布日期
2004.07.22
申请号
WO2003US35327
申请日期
2003.11.06
申请人
ADVANCED MICRO DEVICES, INC.
发明人
SONDERMAN, THOMAS, J.;PASADYN, ALEXANDER, J.;CHERRY, GREGORY, A.