发明名称 WAFER SUPPORT PLATE
摘要 PROBLEM TO BE SOLVED: To easily treat a semiconductor wafer thinned by grinding and to make it possible to always recognize crystal azimuth even when a notch is caused in the outer periphery of the semiconductor wafer. SOLUTION: The semiconductor wafer is supported by the supporting surface 11 of a wafer support plate 10 on which a crystal azimuth mark 12 indicating the crystal azimuth of the semiconductor wafer is formed and the crystal azimuth can be always recognized by the crystal azimuth mark 12. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004207606(A) 申请公布日期 2004.07.22
申请号 JP20020377077 申请日期 2002.12.26
申请人 DISCO ABRASIVE SYST LTD 发明人 ARAI KAZUNAO;NANJO MASATOSHI;KITAMURA MASAHIKO;NAMIOKA SHINICHI;YAJIMA KOICHI
分类号 H01L21/683;H01L21/00;H01L21/304;H01L21/68;H01L21/687;(IPC1-7):H01L21/304 主分类号 H01L21/683
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