发明名称 PRODUCTION METHOD AND PRODUCTION APPARATUS OF SEMICONDUCTOR ULTRAFINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a production method of semiconductor ultrafine particles in a narrow particle diameter distribution and excellent in light absorption and emission characteristics at a high productivity, and a production apparatus thereof. SOLUTION: The production method of the semiconductor ultrafine particles is carried out by dropwise titrating a semiconductor raw material and a liquid phase medium on a heated reaction plate, generating a semiconductor crystal on the reaction plate, growing the crystal, and then recovering the reaction solution passed through the reaction plate. Accordingly, the reaction can easily be stopped at an arbitrary state by controlling the length of the reaction plate and temperature condition and the like and thus semiconductor ultrafine particles in a desired and narrow particle diameter distribution can be produced. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004202406(A) 申请公布日期 2004.07.22
申请号 JP20020375900 申请日期 2002.12.26
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAJO SHIGEKI;YAMAGUCHI YUKIO
分类号 B01J19/00;C09K11/08;(IPC1-7):B01J19/00 主分类号 B01J19/00
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