发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which can be used for an underfill agent. <P>SOLUTION: [1] The positive photosensitive composition comprises an epoxy compound having two or more epoxy groups in one molecule, a curing catalyst or a compound which produces a curing catalyst by heat, and sulfonic acid esters. [2] A semiconductor member is manufactured by applying the above positive photosensitive composition onto a substrate, exposing, curing the unexposed part by heat, and developing the exposed part. [3] A display member is manufactured by applying the above positive photosensitive composition onto a substrate, exposing, curing the unexposed part by heat and developing the exposed part. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004206058(A) 申请公布日期 2004.07.22
申请号 JP20030186616 申请日期 2003.06.30
申请人 SUMITOMO CHEM CO LTD 发明人 YAHAGI AKIRA
分类号 G03F7/004;C08G59/68;G03F7/00;G03F7/027;G03F7/038;G03F7/039;H01L21/027;H01L21/56;H01L23/29;H01L23/31 主分类号 G03F7/004
代理机构 代理人
主权项
地址