TOOL MEMBER HAVING AMORPHOUS CARBON FILM CONTAINING SILICON AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a tool member for forming a amorphous carbon film containing silicon, and superior in working characteristic. SOLUTION: This tool member is characterized by forming the silicon-containing amorphous carbon film having an atomic ratio of Si0.03 to 0.25C0.30 to 0.75H0.22 to 0.50on a surface. Such a tool member forms an intermediate layer on a base material surface, and forms the silicon-containing amorphous carbon film having an atomic ratio of Si0.03 to 0.25C0.30 to 0.75H0.22 to 0.50by using a plasma CVD (chemical vapor deposition) after applying activation processing. COPYRIGHT: (C)2004,JPO&NCIPI