发明名称 |
ICED FILM SUBSTRATE CLEANING |
摘要 |
Apparatus for cleaning a surface of a substrate includes a cooling device, which is adapted to cool a region of the substrate in a vicinity of a particle on the surface, so as to cause a fluid in contact with the surface to form a frozen film in the vicinity of the particle. A radiation source is adapted to direct a beam of energy toward the surface so as to cause vaporization of the film due to absorption of the beam in the film, thereby facilitating removal of the particle from the surface.
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申请公布号 |
US2004140298(A1) |
申请公布日期 |
2004.07.22 |
申请号 |
US20030348781 |
申请日期 |
2003.01.21 |
申请人 |
APPLIED MATERIALS ISRAEL LTD |
发明人 |
WIDMANN AMIR;YOGEV DAVID;UZIEL YORAM |
分类号 |
B08B7/00;H01L21/00;H05K3/26;(IPC1-7):B23K26/38;B23K26/14 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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