| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure device which transfers a pattern at a proper accuracy controlling an environmental change, even if a liquid flows out to an outside of a substrate, when an exposure processing is applied by a liquid immersion method. <P>SOLUTION: The exposure device exposes the substrate P by filling at least a part of space between a projection lens system PL and the substrate P with the liquid 50, and by projecting an image of the pattern on the substrate P through the projection lens system PL. An optical element 60 and a lens-barrel PK, which are parts to contact to the liquid 50 when the substrate P moves, are applied by a surface treatment to adjust an affinity to the liquid 50. A proper liquid immersion state is maintained as a bubble generation in the liquid between the projection lens system, the substrate is prevented and the liquid is kept between the projection lens system and the substrate at all times. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
