| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography projector decreasing deformation caused by contaminants and the severity of requirements for a plane surface against the rear surface of a plate with a projection and the front surface of a chuck simultaneously by using the plate with the projection between a removable item and a flexible member. SOLUTION: The lithography projector comprises a radiation system for supplying a projection beam of radiation, a supporting structure for supporting a patterning means of making the projection beam patternized by a desired pattern, a substrate table for supporting the substrate, and a projection system for projecting a patternized beam on a target section of the substrate. Further, the projector comprises at least one supporting structure providing at least one flexible member supporting the plate with the projection which supports the removable item used for the lithography projector. COPYRIGHT: (C)2004,JPO&NCIPI |
