发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <p>A radiation-sensitive resin composition comprising: a resin having acid-dissociable groups which is insoluble or sparingly soluble in alkalis, has a specific structure that makes the resin alkali-soluble by the action of an acid, and is obtained by living radical polymerization; and a radiation-sensitive acid generator, wherein the ratio of the weight-average molecular weight to the number-average molecular weight of the resin having acid-dissociable groups [(weight-average molecular weight)/(number-average molecular weight)] is 1.5 or lower.</p>
申请公布号 WO2004061525(A1) 申请公布日期 2004.07.22
申请号 WO2003JP16640 申请日期 2003.12.24
申请人 JSR CORPORATION;NISHIMURA, ISAO;FUJIWARA, KOUICHI;KOBAYASHI, EIICHI;SHIMOKAWA, TSUTOMU;NAKAMURA, ATSUSHI;YONEDA, EIJI;WANG, YONG 发明人 NISHIMURA, ISAO;FUJIWARA, KOUICHI;KOBAYASHI, EIICHI;SHIMOKAWA, TSUTOMU;NAKAMURA, ATSUSHI;YONEDA, EIJI;WANG, YONG
分类号 C08F4/00;G03F7/004;G03F7/039;(IPC1-7):G03F7/004 主分类号 C08F4/00
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