发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE AND EXPOSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a projection optical system which can secure a large and substantial image-side numerical aperture by excellently suppressing reflection loss on an optical surface by interposing a medium with a high refractive index in an optical path to an image plane. SOLUTION: The projection optical system forms an image of a 1st surface (R) on a 2nd surface (W). The projection optical system has a boundary lens (L211; Lb) whose 1st surface has positive refracting power, the optical path between the boundary lens and the 2nd surface is filled with a medium having a refractive index larger than 1.1, and a condition ¾Ns-Nm¾<0.08 is met, where Nm is the refractive index of the medium and Ns the refractive index of an optical material forming the boundary lens. In the optical path between the boundary lens and 2nd surface, at least one optical member (Lp) having nearly no refracting power is arranged to be freely insertably and extractably. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004205698(A) 申请公布日期 2004.07.22
申请号 JP20020372945 申请日期 2002.12.24
申请人 NIKON CORP 发明人 OMURA YASUHIRO;IKEZAWA HIRONORI;SHIRAI TAKESHI
分类号 G02B13/24;G02F1/13;G03F7/20;H01L21/027;(IPC1-7):G02B13/24 主分类号 G02B13/24
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