| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing apparatus, which appropriately performs pressure control for each processing, even if a plurality types of processings, the processing pressure ranges of which different widely, are performed. SOLUTION: The processing apparatus has a processing vessel 4 provided with a mounting board 8 to mount a processed object W, a gas inlet means 10 for introducing processing gas, and processing gas supply systems 14, 16 and 18 for supplying specified processing gas. In addition, the processing apparatus also has an inert gas supply system 12 for supplying the inert gas, an evacuation system 32 provided with a pressure control valve 36, the opening degree of which can be adjusted, and a vacuum pump 38, and a pressure gauge 48. When processing, in which partial pressure of processing gas is important, is performed, processing gas is made to flow by a specified amount and the opening degree of the pressure control valve is controlled, based on a detected value of the pressure gauge. When processing, in which the partial pressure of the processing gas is not comparatively important, the opening degree of the pressure control valve is fixed at a specified value, and the supplied amount of the inert gas is controlled, based on the detected value of the pressure gauge. COPYRIGHT: (C)2004,JPO&NCIPI
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