发明名称 EXPOSURE DEVICE AND CONTROL METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To enhance image quality by enabling density with fine unevenness to be corrected in real time. SOLUTION: In an exposure device and a control method therefor, a sensitive material is exposed to light by an exposure light source so that a latent image can be formed. The exposure device comprises: a measuring means for measuring the quantity of transmitted light of an exposure beam through a recording medium or the quantity of reflected light of the exposure beam from the recording medium, concurrently with exposure writing; a correction amount computing means for determining the amount of correction from a deviation of an actual density value, which is obtained from the quantity of the transmitted light or that of the reflected light, measured by the measuring means, from a write density assumed value; and a correction means for correcting a light quantity value at subsequent exposure writing in accordance with the amount of the correction, which is computed by the correction amount computing means. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004202897(A) 申请公布日期 2004.07.22
申请号 JP20020375661 申请日期 2002.12.25
申请人 KONICA MINOLTA HOLDINGS INC 发明人 NAKAMURA YUKITO;UMEDA TOSHIKAZU
分类号 B41J2/44;G01N21/47;G01N21/59;(IPC1-7):B41J2/44 主分类号 B41J2/44
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