发明名称 METHOD FOR MEASURING STRAIN OF MICROSTRUCTURE
摘要 PURPOSE: A method for measuring the stain of a microstructure is provided to improve resolution by placing a zoom lens and to improve processing speed by removing a pre-treatment process of an object. CONSTITUTION: A method for measuring the stain of a microstructure comprises the steps of obtaining images of two points of a test piece(2) by using an objective lens(4), separating the images by a beam splitter(6), obtaining images by making the separated images pass through a zoom lens(10a) and imaging the images by a camera(12a), recognizing a pattern from the obtained images, and calculating displacement at each position by tracing the recognized pattern.
申请公布号 KR20040065505(A) 申请公布日期 2004.07.22
申请号 KR20030002499 申请日期 2003.01.14
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 LEE, SUN BOK;PARK, TAE SANG
分类号 G01B11/16;(IPC1-7):G01B11/16 主分类号 G01B11/16
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