发明名称 |
METHOD FOR MEASURING STRAIN OF MICROSTRUCTURE |
摘要 |
PURPOSE: A method for measuring the stain of a microstructure is provided to improve resolution by placing a zoom lens and to improve processing speed by removing a pre-treatment process of an object. CONSTITUTION: A method for measuring the stain of a microstructure comprises the steps of obtaining images of two points of a test piece(2) by using an objective lens(4), separating the images by a beam splitter(6), obtaining images by making the separated images pass through a zoom lens(10a) and imaging the images by a camera(12a), recognizing a pattern from the obtained images, and calculating displacement at each position by tracing the recognized pattern.
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申请公布号 |
KR20040065505(A) |
申请公布日期 |
2004.07.22 |
申请号 |
KR20030002499 |
申请日期 |
2003.01.14 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
LEE, SUN BOK;PARK, TAE SANG |
分类号 |
G01B11/16;(IPC1-7):G01B11/16 |
主分类号 |
G01B11/16 |
代理机构 |
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