| 摘要 |
PROBLEM TO BE SOLVED: To obtain a reflection spectrum measuring apparatus capable of obtaining a reflection spectrum whose spatial resolution is less than the wavelength of measurement light, namely a submicron or less. SOLUTION: In addition to a spectral ellipsometer, there are a probe 9; a second light source 10 that becomes an excitation light emission means for emitting excitation light for generating near-field light; and a 3D actuator 11 that becomes a movement means for allowing the probe to approach a sample emission surface of the measurement light. The probe 9 has a minute opening whose aperture is smaller than the wavelength of the measurement light; the excitation light for generating the near-field light is emitted from the second light source 10; the near-field light is generated at the tip of the probe 9 through an optical fiber 12 made of quartz; and the probe 9 is allowed to approach a sample surface with the 3D actuator 8 as the movement means. COPYRIGHT: (C)2004,JPO&NCIPI
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