METHOD AND APPARATUS FOR CLEANING/DRYING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning/drying a substrate, in which a particle can be restrained from being stuck to the substrate and the particle stuck to the substrate can be removed by rinsing the substrate under the condition that the Marangoni effect can be utilized to the most and the consumption of an organic solvent to be used is small and which can be used safely. SOLUTION: This method comprises a step to clean the substrate, a step to rinse the cleaned substrate by purified water and a step to dry the rinsed substrate. When rinsing water is removed from the surface of the substrate immersed in the rinsing water, the rinsing water is removed at 0.1-50mm/s removal speed and periphery of the substrate to be exposed from the rinsing water is placed in the atmosphere that the vapor concentration of the organic solvent is adjusted to 0.1-4.0%. COPYRIGHT: (C)2004,JPO&NCIPI