发明名称 EQUIPMENT FOR MEASURING DISTRIBUTION OF VOID OR PARTICLE SIZE
摘要 <p>Equipment for measuring distribution of void or particle size capable of measuring the size of a void or a particle in a short time with high accuracy. When the size of a void Y existing in a porous insulator film (3) or the size of a particle in a thin film is measured, a sample (5) having the insulator film (3) formed on the surface of a substrate (4) is irradiated, from the surface side thereof, with X-rays R at a specified incident angle thetai larger than the total reflection critical angle of the insulator film (3) but not exceeding 1.3 times the total reflection critical angle of the substrate (4). X-rays beamed into the insulator film (3) and reflected off the surface of the substrate (4) and not entering the void Y but exiting the insulator film (3) are a scattering component and such a scattering component as having a larger exit angle as compared with that when the reflecting component does not enter the void Y but exits the insulator film (3) is detected.</p>
申请公布号 WO2004061428(A1) 申请公布日期 2004.07.22
申请号 WO2003JP16918 申请日期 2003.12.26
申请人 TECHNOS INSTITUTE CO., LTD.;TERADA, SHINICHI 发明人 TERADA, SHINICHI
分类号 G01N15/14;G01N15/08;G01N23/203;(IPC1-7):G01N15/02 主分类号 G01N15/14
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