发明名称 COATING METHOD AND COATING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a coating method and a coating apparatus capable of enhancing appearance and endurance by uniformizing the thickness of a coating film when the coating film is formed on the surface of a coating object matter by a dipping method. <P>SOLUTION: In the conventional arts, a coating liquid flows from a higher position to a lower position so that the thickness of the film at the lower position is heavier than that at the higher position to cause a variation in film thickness. In the method, the flow of the coating liquid is taken into consideration and the lifting speed of the coating object matter is gradually decreased to uniformize the thickness of the film as the result of the consideration. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004202463(A) 申请公布日期 2004.07.22
申请号 JP20020378061 申请日期 2002.12.26
申请人 SEIKO EPSON CORP 发明人 TAKADA KEISUKE;SEKI HIROYUKI
分类号 G02B1/11;B05C3/09;B05D1/18;B05D7/00 主分类号 G02B1/11
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