| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a fine waviness reduction agent which efficiently reduces the fine waviness of a substrate, a polishing fluid composition containing the fine waviness reduction agent, a method of reducing the waviness of a substrate for a precision part by using the polishing fluid composition, and a method for manufacturing a substrate by using the above polishing fluid composition. <P>SOLUTION: The polishing fluid composition for a precision part substrate comprises a fine waviness reduction agent for polishing a precision part substrate composed of a polycarboxylic acid compound having an OH group or an SH group and a total carbon number of 2-15 or its salt, a polishing material, and water. The method of reducing the fine waviness of a precision part substrate uses the polishing fluid composition. The method for manufacturing a substrate comprises a step of polishing a substrate to be polished with the use of the above polishing fluid composition. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
