发明名称 ETCHING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an etching apparatus by which the dispersion of etching rates can be reduced as small as possible in forming a wiring pattern on a printed circuit board. SOLUTION: In the etching apparatus, 21 nozzles 1 for ejecting an etchant are installed on a plate member that swings in the direction rectangularly crossing the transfer direction of a substrate 2 (e.g., copper thinly formed on a polyimide film) in a manner that all of the positions of swing direction are different from each other. The times of swing of the nozzles per minute are set so that the transfer rate of the substrate 2 may be equal to the value resulting by dividing the pitch among the nozzles in the transfer direction by an integer. Therefore, the loci of the centers of the respective nozzles drawn on the substrate 2 do not cross or coincide with each other. It does not therefore happen that the etching rate is extremely high at the crossing or coincidence, which can reduce the dispersion of etching rates. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004204329(A) 申请公布日期 2004.07.22
申请号 JP20020377158 申请日期 2002.12.26
申请人 SUMITOMO METAL MINING CO LTD 发明人 KANDA EIZABURO;NAKAMURA SHINICHI
分类号 C23F1/08;H01L21/306;H05K3/06;(IPC1-7):C23F1/08 主分类号 C23F1/08
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