发明名称 |
TRÄGERPLATTE MIT RANDSTEUERUNG FÜR CHEMISCH-MECHANISCHES POLIEREN |
摘要 |
<p>A carrier head, particularly suited for chemical mechanical polishing of a flatted substrate, includes a flexible membrane and an edge load ring. A lower surface of the flexible membrane provides a receiving surface for a center portion of the substrate, whereas a lower surface of the edge load ring provides a receiving surface for a perimeter portion of the substrate. A slurry suitable for chemical mechanical polishing a flatted substrate includes water, a colloidal silica that tends to agglomerate, and a fumed silica that tends not to agglomerate.</p> |
申请公布号 |
DE69912307(T2) |
申请公布日期 |
2004.07.22 |
申请号 |
DE1999612307T |
申请日期 |
1999.11.22 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZUNIGA, STEVEN;CHEN, HUNG;PRABHU, B. |
分类号 |
B24B37/30;B24B37/32;H01L21/304;(IPC1-7):B24D5/00 |
主分类号 |
B24B37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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