| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography equipment with a debris restraining means and a device manufacturing method. <P>SOLUTION: The device, which is a lithography projector imaging a mask pattern in a mask on the surface of a substrate, comprises a radiation system constituted/arranged in order to supply a radiation projection beam, a first object table constituted in order to support the mask, a second object table constituted in order to support a substrate, and a projection system constituted/arranged in order to image a projected part of the mask on a target section of the substrate. The device further comprises an electrode which generates electrical discharge between a radiation source and the electrode by applying electric field. The electric field applied to the device removes undesirable contaminants (debris) formed by the radiation source. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
