DEVICE AND METHOD FOR MICROWAVE PLASMA PROCESSING AND MICROWAVE POWER SUPPLY DEVICE

摘要

A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.