SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING,申请号KR20047007317-传众专利搜索

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发明名称	SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING
摘要
申请公布号	KR20040065222(A)	申请公布日期	2004.07.21
申请号	KR20047007317	申请日期	2002.11.14
申请人		发明人
分类号	C23C14/34;C23C14/35;C25D5/02;H01L21/28;H01L21/285;H01L21/768	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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