发明名称 FIELD EMISSION DEVICE HAVING DUAL GATE STRUCTURE AND FABRICATION METHOD THEREFORE
摘要 PURPOSE: A field emission device(FED) and a fabrication method of the FED are provided to prevent an electrical short circuit phenomena between a dual gate and a field emitter. CONSTITUTION: A field emission device comprises a plate(110); a cathode layer(120) formed on the plate, a gate insulating layer(130) formed on the cathode layer and the plate and which includes a cavity(170) for exposing a part of the cathode layer; a field emitter(190) located on the cathode layer exposed at a bottom of the cavity; a first gate layer(140) located in the gate insulating layer and forming a first gate hole(140a) having a larger diameter than a diameter of the cavity to not expose at an inner circumferential surface of the cavity, and a second gate layer(160) formed on the gate insulating layer and forming a second gate hole(160a) at a region corresponding to the cavity.
申请公布号 KR20040065006(A) 申请公布日期 2004.07.21
申请号 KR20030002093 申请日期 2003.01.13
申请人 SAMSUNG SDI CO., LTD. 发明人 AHN, PIL SU;LEE, HANG U;ZOULKARNEEV, ANDREI
分类号 H01J9/02;H01J1/304;H01J9/18;H01L27/148;(IPC1-7):H01J1/304 主分类号 H01J9/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利