发明名称 |
FIELD EMISSION DEVICE HAVING DUAL GATE STRUCTURE AND FABRICATION METHOD THEREFORE |
摘要 |
PURPOSE: A field emission device(FED) and a fabrication method of the FED are provided to prevent an electrical short circuit phenomena between a dual gate and a field emitter. CONSTITUTION: A field emission device comprises a plate(110); a cathode layer(120) formed on the plate, a gate insulating layer(130) formed on the cathode layer and the plate and which includes a cavity(170) for exposing a part of the cathode layer; a field emitter(190) located on the cathode layer exposed at a bottom of the cavity; a first gate layer(140) located in the gate insulating layer and forming a first gate hole(140a) having a larger diameter than a diameter of the cavity to not expose at an inner circumferential surface of the cavity, and a second gate layer(160) formed on the gate insulating layer and forming a second gate hole(160a) at a region corresponding to the cavity.
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申请公布号 |
KR20040065006(A) |
申请公布日期 |
2004.07.21 |
申请号 |
KR20030002093 |
申请日期 |
2003.01.13 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
AHN, PIL SU;LEE, HANG U;ZOULKARNEEV, ANDREI |
分类号 |
H01J9/02;H01J1/304;H01J9/18;H01L27/148;(IPC1-7):H01J1/304 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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