发明名称 |
Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it |
摘要 |
The invention relates to a halftone phase shift photomask which is controlled with precision in terms of its transmittance at a wavelength applied to inspection, and measuring equipment, so that its quality can easily be assured even when its phase difference at an exposure wavelength is controlled at 180� C. with precision and its transmittance is set at 1 to 20% as desired at that wavelength. The halftone phase shift photomask (107) comprises on a transparent substrate (101) and a halftone phase shift film containing at least tantalum, oxygen, carbon and nitrogen, and has a multilayer structure comprising at least two or more different layers (102) and (103). |
申请公布号 |
US6764792(B1) |
申请公布日期 |
2004.07.20 |
申请号 |
US20010830598 |
申请日期 |
2001.04.27 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
FUJIKAWA JUNJI;KINASE YOSHINORI;OKAMURA TAKAFUMI;MOHRI HIROSHI;YOKOYAMA TOSHIFUMI;KOKUBO HARUO |
分类号 |
H01L21/027;G03F1/00;G03F1/08;G03F1/32;G03F1/68;(IPC1-7):G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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