| 摘要 |
FIELD: apparatus for performing physico-chemical processes, such as absorption, desorption, dust and gas removal, mixing, cooling of gases; chemical industry; metallurgy. ^ SUBSTANCE: mounted above vortex contact unit is disk-shaped cylindrical sprinkler; located in lower portion of housing is exhaust pipe whose diameter is equal to diameter of separator; it is mounted at clearance equal to 0.2-0.8 of diameter of separator, Vortex contact unit is made from convex tangential plates. Vortex apparatus has housing 1, upper swirling part 3 with vortex contact unit which consists of plate 2, cover 12, separator 11, convex tangential plates 4, lower separating part 5, tangential gas inlet branch pipe 6 and liquid supply and discharge branch pipes 7 and 8. Mounted above vortex contact unit is disk-shaped cylindrical sprinkler 9; lower part of apparatus is provided with exhaust pipe 10 which is mounted at clearance of 0.2-0.8 of diameter of separator relative to separator 11. ^ EFFECT: enhanced efficiency at low hydraulic resistance due to organization of descending flow of interacting phases. ^ 2 cl, 2 dwg |
