发明名称 ORGANOSILOXANE POLYMER SUITABLE FOR USE AS A BASE POLYMER IN PHOTO-CURABLE RESIN COMPOSITIONS, PHOTO-CURABLE RESIN COMPOSITION COMPRISING THE SAME, PATTERNING PROCESS USING THE COMPOSITION, AND SUBSTRATE PROTECTIVE FILM MADE FROM THE COMPOSITION
摘要 PURPOSE: Provided are a photo-curable resin composition which can be exposed to light having a wide range of wavelength and form a highly elastic, transparent, minute pattern, a substrate protective film made thereof which has a high dielectric strength and improved adhesion to substrates and a novel organosiloxane polymer useful in the composition, and a photo-curable resin composition which can form a pattern having improved substrate adhesion, especially high resolution and adhesion on a copper surface and dry etching resistance, a patterning process using the same, and a substrate protective film. CONSTITUTION: The organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane of the following average compositional formula (I), an alkenyl-containing organopolysiloxane of the following average compositional formula (II) and an unsaturated compound of the following general formula (III) or (IV). In average compositional formula (I) represented by R¬1aHbSiO(4-a-b)/2, wherein a and b are positive numbers satisfying 0<=a<3, 0<b<=3 and 0<a+b<=3, and R¬1 is independently an organic radical selected from aliphatic unsaturation-free, substituted or unsubstituted, monovalent hydrocarbon radicals having 1 to 30 carbon atoms. In average compositional formula (II) represented by R¬3cR¬4dSiO(4-c-d)/2, wherein c and d are positive numbers satisfying 0<=c<3, 0<d<=3 and 0<c+d<=3, R¬3 is independently an organic radical selected from aliphatic unsaturation-free, substituted or unsubstituted, monovalent hydrocarbon radicals having 1 to 30 carbon atoms, and R¬4 is an alkenyl radical, general formula (III), general formula (IV). The photo-curable resin composition comprises (A) the organosiloxane polymer, (B) at least one compound selected from the group consisting of an amino condensate modified with formalin or formalin-alcohol, a phenol compound having on the average at least two methylol or alkoxymethylol radicals in a molecule, and an epoxy compound having on the average at least two epoxy radicals in a molecule, and (C) a photoacid generator.
申请公布号 KR20040064596(A) 申请公布日期 2004.07.19
申请号 KR20030091382 申请日期 2003.12.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 ARAI KAZUHIRO;KATO HIDETO;ASAI SATOSHI
分类号 G03F7/038;C08F230/08;C08F290/06;C08G77/50;C08L61/20;C08L63/00;C08L83/14;G03F7/075;H01L21/027;(IPC1-7):G03F7/075 主分类号 G03F7/038
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