| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a method of manufacturing the same with which migration of processing solution mist into the lower surface side of the substrate can be sufficiently prevented without stopping the rotation of substrate being processed, when the process is executed by supplying the processing solution to the substrate while it is rotated. SOLUTION: A plurality of vertically moving pins MP which can be moved vertically while placing a substrate W thereon, and a holding pin HP which can hold the substrate W placed on the vertically moving pins MP by pressing the substrate W from sideways, are provided to rotate integrally with a spin base on the spin base which can rotate in the horizontal attitude. Moreover, a mechanism including a bearing or the like is connected to transfer the movement to the vertically moving pins MP and the holding pin HP. The descending/ascending motions obtained from a motor or the like placed at stationary positions can be transferred as the holding/releasing motion of the holding pin HP even during the rotation via the mechanism including the bearing or the like. Similarly, such descending/ascending motion can also be transferred as the descending/ascending motion of the vertically moving pins MP. COPYRIGHT: (C)2004,JPO&NCIPI
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