| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a work carrier for a double-sided polishing machine suitably used for polishing work of an extremely thin workpiece and superior in rigidity and abrasion resistance, and its manufacturing method. <P>SOLUTION: Since this manufacturing method includes an electrodeless plating process of forming a metallic structure 20 including a large number of aggregates 18 in a surface of a base board by soaking the prescribed base board in an electrodeless plating liquid including a large number of aggregates 18, besides a thickness dimension of the carrier 10 can be maximally and uniformly formed, the rigidity and the abrasion resistance sufficiently endurable against the polishing work by the double-sided polishing machine can also be imparted. That is, the carrier 10 suitably used for the polishing work of the extremely thin workpiece and superior in the rigidity and the abrasion resistance and its manufacturing method can be provided. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
