发明名称 SUBSTRATE TREATMENT DEVICE, ITS OPERATING METHOD AND ITS PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of reducing power consumption while maintaining through-put. <P>SOLUTION: A substrate treatment device 1 is selectively provided with not only a normal mode for starting all units but also an energy saving mode. When the latter is selected, only a necessary unit which is absolutely necessary for substrate treatment is started, and applied to the substrate treatment. When it is necessary to increase treatment efficiency, an additional unit may be started, and applied to the substrate treatment. In a stand-by state, only the necessary unit may be started while others are stopped, or all the units may be stopped. Also, even when the normal mode is selected, transition to the energy saving mode is made executable after the continuity of a stand-by state in a fixed time or longer. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004200485(A) 申请公布日期 2004.07.15
申请号 JP20020368415 申请日期 2002.12.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 AKIYAMA KAZUYA;AZUMA TORU;KOYAMA YASUFUMI
分类号 H01L21/027;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):H01L21/027 主分类号 H01L21/027
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