发明名称 ELECTRON BEAM DIFFRACTING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electron beam diffracting device capable of arbitrarily selecting a shape of a measurement area and making a display easily to be confirmed by superimposing a diffractive measurement area on a microscope image in which a blurred diffractive figure is not confirmed. <P>SOLUTION: This device has an electron beam generating source; an electron beam converging means; and a deflection means, records and/or images an electron diffractive pattern result from a target sample, keeps a convergent half angularα(rad) of an electron beam atα<1×10<SP>-3</SP>(1), and a diameter D (nm) of the electron beam at D<1.22×λ/α(λis a wavelength of the electron beam) (2) so as to control a spot position of the electron beam on a target sample surface, and sets a misalignmentδ(rad) of an axis of the electron beam resulting from movement of an irradiation position of the electron beam so as to establish a relation ofδ<α(3) when the irradiation position of the electron beam is moved maximum. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004199884(A) 申请公布日期 2004.07.15
申请号 JP20020363572 申请日期 2002.12.16
申请人 SONY CORP;JEOL LTD 发明人 IWASAKI HIROSHI;ITO TAKUYA;TOMITA TAKESHI;OKUNISHI EIJI
分类号 G01N23/207;H01J37/073;H01J37/147;H01J37/22;H01J37/26;(IPC1-7):H01J37/26 主分类号 G01N23/207
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