发明名称 |
Method for improving OPC modeling |
摘要 |
The invention provides a method for OPC modeling. The procedure for tuning a model involves collecting cross-section images and critical dimension measurements through a matrix of focus and exposure settings. These images would then run through a pattern recognition system to capture top critical dimensions, bottom critical dimensions, resist loss, profile and the diffusion effects through focus and exposure.
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申请公布号 |
US2004139420(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030341119 |
申请日期 |
2003.01.13 |
申请人 |
BRIST TRAVIS;BAILEY GEORGE |
发明人 |
BRIST TRAVIS;BAILEY GEORGE |
分类号 |
G03F7/20;G06F17/50;G06F19/00;G06K9/03;G06K9/20;G06K9/46;(IPC1-7):G06F17/50 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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