发明名称 |
Device and method for plasma processing, and slow-wave plate |
摘要 |
In a microwave plasma processing apparatus that uses a radial line slot antenna, a slot plate (16) is formed by a material having a thermal expansion rate close to the wave retardation plate (18), or depositing a metal on a dielectric plate constituting the wave retardation plate (18). An intimate contact between the wave retardation plate and a slot plate constituting a microwave radiation surface is improved so as to prevent an abnormal electric discharge.
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申请公布号 |
US2004134613(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20020296619 |
申请日期 |
2002.11.26 |
申请人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA |
发明人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;SUGAWA SHIGETOSHI;GOTO TETSUYA |
分类号 |
H05H1/46;B01J19/08;C23C16/511;H01J37/32;H01L21/302;H01L21/31;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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