| 摘要 |
Vibration-attenuation devices and methods are disclosed that utilize a bellows situated between a first and second mass and pressurized with a fluid to an internal fluid pressure substantially equal to a zero-stiffness pressure such that the bellows exhibits a substantially zero lateral stiffness. The devices may include various components configured to measure, regulate, and control the internal pressure of the bellows in order to maintain a desired pressure. The devices may include an active support, such as a secondary bellows or linear actuator, that provides a secondary support force. The active support may be connected to various components configured to measure and control the secondary support force. The vibration-attenuation devices disclosed may be used in a lithography exposure apparatus to attenuate vibrations between: (1) a support frame and a support surface; (2) a base and a stage-supporting platform; and (3) a supporting stage and a wafer stage.
|
