| 发明名称 |
magnetoresistance apparatus having reduced overlapping of permanent magnet layer and method for manufacturing the same |
| 摘要 |
In a magnetoresistance apparatus including a first functional layer and a second functional layer magnetically connected to the first functional layer, an overlapping ratio of the second functional layer onto the first functional layer is approximately 0 to 10 percent.
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| 申请公布号 |
US2004134877(A1) |
申请公布日期 |
2004.07.15 |
| 申请号 |
US20040750946 |
申请日期 |
2004.01.05 |
| 申请人 |
TDK CORPORATION |
发明人 |
ISHIWATA NOBUYUKI;MORI SHIGERU;NAGAHARA KIYOKAZU;ISHI TSUTOMU;ISHIHARA KUNIHIKO;FUKAMI EIZO;NAKADA MASAFUMI |
| 分类号 |
G11B5/39;G01R33/09;G11B5/31;H01F41/30;(IPC1-7):B44C1/22 |
主分类号 |
G11B5/39 |
| 代理机构 |
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代理人 |
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