发明名称 Gamma detecting discharge device and method of forming the same
摘要 A thin film ferroelectric/piezoelectric discharge device exhibits a stable high electrical resistance state. With an applied voltage, electron avalanche breakdown occurs and the device exhibits a low resistance state and recovers from this state. Thereby it is a solid state spark gap. With reduction of the voltage after breakdown the conduction of current ensues and contributes to the spontaneous recovery of the high resistive state evidenced by the measured increase in resistance in time. Gamma radiation ionization perturbs this recovery rate and this can be measured and differentiated from the conduction current induced resistance change. Thereby it is a room temperature gamma detector. The device is made by growing a controlled thickness of oxide on a titanium metal or alloy (12) surface (14) by anodization; heating in a metal oxide powder transforming the oxide into a ferroelectric/piezoelectric (16); and applying an electrode (18) to the exposed ferroelectric/piezoelectric surface.
申请公布号 US2004135095(A1) 申请公布日期 2004.07.15
申请号 US20030341962 申请日期 2003.01.13
申请人 HOLMQUIST GLENN ALLEN 发明人 HOLMQUIST GLENN ALLEN
分类号 G01T1/185;H01L41/24;(IPC1-7):G01T1/185 主分类号 G01T1/185
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