WAFER CLEANER, AND APPLICATOR WITH CLEANING FUNCTION

摘要

PROBLEM TO BE SOLVED: To provide a cleaner capable of efficiently removing an organic contaminant on the wafer surface. SOLUTION: The wafer cleaner is provided with a holder that holds a wafer, an ozone generator that supplies the wafer with ozone gas, a cooling means that cools the wafer down to a room temperature or below during cleaning with the ozone gas, and a temperature restoring part that restores the temperature of the wafer to a room temperature after cleaning with the ozone gas. COPYRIGHT: (C)2004,JPO&NCIPI