发明名称 Exposure apparatus and method
摘要 An exposure method for exposing a pattern onto plural portions on an object includes the steps of obtaining first flatness information about the plural portions, specifying a portion among the plural portions, which has flatness information that meets a predetermined condition among the first flatness information, obtaining second flatness information that is more detailed than the first flatness information about the portion specified by the specifying step, and exposing, based on the second flatness information, the portion that has been specified.
申请公布号 US2004135981(A1) 申请公布日期 2004.07.15
申请号 US20040752120 申请日期 2004.01.05
申请人 INA HIDEKI 发明人 INA HIDEKI
分类号 G03F7/20;G03B27/52;G03B27/68;G03F9/00;G03F9/02;H01L21/027;(IPC1-7):G03B27/52 主分类号 G03F7/20
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