发明名称 |
Apparatus and reactor for generating and feeding high purity moisture |
摘要 |
A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
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申请公布号 |
US2004137744(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030724101 |
申请日期 |
2003.12.01 |
申请人 |
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发明人 |
OHMI TADAHIRO;IKEDA NOBUKAZU;MINAMI YUKIO;KAWADA KOUJI;KOMEHANA KATUNORI;HONIDEN TERUO;HIRAI TOURU;MORIMOTO AKIHIRO;NARIAI TOSHIROU;HIRAO KEIJI;TAGUCHI MASAHARU;NAKAMURA OSAMU |
分类号 |
B01J3/00;B01J7/00;B01J12/00;C01B5/00;(IPC1-7):H01L21/311 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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