发明名称 MEASURING METHOD FOR RADIUS OF SHOULDER CIRCULAR ARC PART OF NOTCH IN SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a measuring method of the radius of the shoulder circular arc part for the wafer notch which enables the measurement of the radius of the shoulder circular arc part in the notch with a higher accuracy. SOLUTION: In the measuring method of the radius of the shoulder circular arc part for the notch of the semiconductor wafer, the shoulder circular arc partin a notch is extracted from the notch part contour data obtained from the image processing of the semiconductor wafer and the starting and ending points of the shoulder circular arc part in the notch are detected using an algorithm to determine the radius of the circular arc part. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004198264(A) 申请公布日期 2004.07.15
申请号 JP20020367278 申请日期 2002.12.18
申请人 TOSHIBA CERAMICS CO LTD 发明人 YAMAZAKI KEISUKE
分类号 G01B11/08;H01L21/66;(IPC1-7):G01B11/08 主分类号 G01B11/08
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