| 摘要 |
PROBLEM TO BE SOLVED: To make the temperature distribution even in a treatment room while suppressing the temperature rise in an outer wall of a heat treatment device. SOLUTION: The periphery of an inner container 70 forming the treatment room S is surrounded by an outer container 80. A ventilation passage 82 is formed between the inner container 70 and the outer container 80 and an inlet 83 is formed on the lower surface part 80a of the outer container 80. An air inlet 84 is formed on the center of the upper surface part 70b of the inner container 70 and gas led from the inlet 83 passes through the ventilation passage 82 and is supplied from the air inlet 84 into the treatment room S. Consequently the gas passing through the ventilation passage 82 absorbs heat of the inner container which is propagated from a heat plate 71 and temperature rise not only of the inner container 70, but also the outer container 80 can be suppressed. Since gas absorbing the heat of the inner container 70 is supplied to the treatment room S, the temperature distribution in the treatment room S held at a high temperature is not disturbed. COPYRIGHT: (C)2004,JPO&NCIPI
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