| 摘要 |
PROBLEM TO BE SOLVED: To provide a multilayer film producing apparatus which prevents oxidation, and deterioration in film properties. SOLUTION: A substrate 12 having a barrier metal coated on its surface is transported to a metal film production apparatus 3 in a state where oxidation is prevented by using a transport chamber 4 in a vacuum state. The member to be etched is subjected to etching in gaseous starting material plasma, so that the precursor of a metal component(s) included in the member to be etched and the gaseous starting material is produced inside a chamber 11. The temperature of the substrate 12 is made lower than that of the member to be etched, so that the metallic component(s) in the precursor is film-deposited on the substrate. COPYRIGHT: (C)2004,JPO&NCIPI
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