| 摘要 |
PROBLEM TO BE SOLVED: To provide a rolling up type vacuum deposition method by which the trouble of electrification in a film base material is eliminated on electron beam deposition, and stable film deposition free from damages can be performed. SOLUTION: In the rolling up vacuum deposition method where a film base material running in a vacuum by a rolling up device is vacuum-deposited by electron beams, a means of introducing gas is provided at a place separated from a film deposition roll depositing an evaporation material on the running base material, and the gas is jetted toward the running base material. COPYRIGHT: (C)2004,JPO&NCIPI
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