发明名称 |
METHOD FOR LOW TEMPERATURE LIQUID-PHASE DEPOSITION AND METHOD FOR CLEANING LIQUID-DEPOSITION APPARATUS |
摘要 |
A method for low temperature liquid-phase deposition and a method for cleaning a liquid-phase deposition apparatus are disclosed. The method for low temperature liquid-phase deposition is employed so as to form a low-temperature grown film or a film with excellent step-coverage on the surface of a semiconductor device having independent circuit functions. The method for cleaning liquid-phase deposition apparatus is characterized in that a loop used exclusively for cleaning is employed so as to prevent SiO2 powders from remaining in the loop. |
申请公布号 |
US2004137753(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030342245 |
申请日期 |
2003.01.15 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
CHANG EDWARD Y.;LIANG MUH-WANG;CHIANG SHIH-MING;TSENG CHIH-YUAN;CHIANG PANG-MIN |
分类号 |
H01L21/316;H01L21/335;H01L23/31;(IPC1-7):H01L21/476;H01L21/31;H01L21/469;H01L21/302 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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