发明名称 METHOD AND APPARATUS FOR VACUUM TREATMENT
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus which performs an interruption processing by interrupting operation and can continue the interrupted treatment after the interruption processing. SOLUTION: The vacuum treatment apparatus comprises, a stop means for interrupting an automatic operation of wafer treatments during treating a wafer having a predetermined conveying order; and a control means for treating the wafer even after interrupted the automatic operation by the stop means, for stopping the wafer treatments after starting the interrupting operation of the wafer, for sampling the wafer for interruption by a conveying system 8 and conveying the wafer to a vacuum treatment chamber via switchable chambers 3 and 4, for returning the treated wafer for interruption to a starting cassette via the switchable chambers 3 and 4, and the conveying system 8, and for restarting to convey the wafer having a predetermined conveying order after the all wafer treatments for interruption are completed. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004200708(A) 申请公布日期 2004.07.15
申请号 JP20040036974 申请日期 2004.02.13
申请人 HITACHI LTD;HITACHI INDUSTRIES CO LTD 发明人 NISHIHATA KOJI;SHIROO KAZUHIRO;IKUHARA SHIYOUJI;TAWARA TETSUYA;OKIGUCHI MASASHI
分类号 H01L21/677;H01L21/02;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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