发明名称 |
Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
摘要 |
A photomask assembly and method for protecting the photomask assembly from contaminants generated during a lithography process are disclosed. A photomask assembly includes a pellicle assembly formed from a pellicle frame and a pellicle film coupled to a first surface of the pellicle frame. The pellicle frame further includes an inner wall and an outer wall. A photomask is coupled to a second surface of the pellicle frame opposite the pellicle film. A molecular sieve that prevents airborne molecular contaminants (AMCs) generated during a lithography process from contaminating the photomask is associated with the pellicle assembly.
|
申请公布号 |
US2004137339(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030696326 |
申请日期 |
2003.10.29 |
申请人 |
DUPONT PHOTOMASKS, INC. |
发明人 |
ZHANG XUN;GORDON JOSEPH STEPHEN;PADUANO JANICE M.;CHEN XIAOMING;REYES JULIO R. |
分类号 |
G03F1/00;G03F1/14;G03F1/64;G03F7/20;(IPC1-7):G03F9/00;B44F1/00;A47G1/12 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|