METHOD FOR LITHOGRAPHICALLY STRUCTURING A SUBSTRATE, AND LACQUER SYSTEM

摘要

The invention relates to a method for lithographically structuring a substrate (10) by means of an electron beam, particularly for producing photomasks. Said method is characterized by the fact that first at least one electrically conductive, water-insoluble lower lacquer layer (1) is applied to the substrate (10), followed by at least one upper lacquer layer (2) made of electron beam-sensitive photoresist so as to create a lacquer system (1, 2). Such a lacquer system allows negative charges to discharge, whereby the electron beam is prevented from being deflected due to charging effects.